Onto Innovation (NYSE: ONTO) — Company Overview, News & Financial Data
Onto Innovation designs equipment for semiconductors, enhancing production processes with advanced metrology and inspection systems.
Onto Innovation
Onto Innovation is a designer and manufacturer of process control tools, optical metrology systems, defect inspection platforms, and lithography equipment used in semiconductor manufacturing. Formed through the merger of Nanometrics Incorporated and Rudolph Technologies, the company provides hardware and software solutions that measure film thickness, critical dimensions, overlay, and surface defects across front-end wafer fabrication, advanced packaging, and specialty semiconductor process steps. Its products enable semiconductor manufacturers to optimize process yield, monitor wafer quality, and manage complex manufacturing workflows globally across foundry, memory, logic, and integrated device manufacturing facilities.
Snapshot
Operations
Products and/or services of Onto Innovation
- Automated Defect Inspection Systems: Surface inspection platforms detect macro defects, particle contamination, and physical anomalies across unpatterned and patterned silicon wafers, supporting high-volume front-end semiconductor fabrication lines and substrate manufacturing plants in North America, Asia, and Europe.
- Optical Metrology Platforms: Non-contact optical measurement tools evaluate critical dimensions, thin film thickness, refractive indices, and multi-layer stack profiles across advanced logic, 3D NAND memory, and DRAM semiconductor fabrication processes to maintain tight yield tolerances.
- Advanced Packaging Lithography Systems: Step-and-repeat lithography systems perform fine-line re-distribution layer patterning, bump alignment, and high-resolution exposure on advanced packaging substrates, glass panels, and reconstituted silicon wafers used in heterogeneous integration and chiplet architectures.
- Overlay Metrology and Lithography Control: Optical overlay inspection tools measure layer-to-layer registration accuracy during photolithography sequences, feeding alignment correction data back to immersion scanners and lithography track systems to prevent pattern misalignment across sub-nanometer node devices.
- Process Control and Yield Analysis Software: Enterprise software suites perform automated yield management, fault detection, offline metrology data analysis, and statistical process control across entire fab networks, processing real-time sensor metrics to accelerate root-cause failure diagnostics.
- Global Technical Support and Spare Parts Services: Customer support services provide on-site field engineering, preventive maintenance, system refurbishments, software upgrades, and replacement parts logistics across regional service centers serving semiconductor fabrication facilities in Taiwan, South Korea, Japan, China, and the United States.
Onto Innovation executive team
- Mr. Michael P. PlisinskiCEO & Director
- Mr. Ramil YaldaeiSVP & COO
- Ms. Yoon Ah E. OhSenior VP, General Counsel & Company Secretary
- Mr. Brian K. Roberts CPAChief Financial Officer
- Mr. Shek Ming Ho C.F.A., CPAVice President of Investor Relations
- Dr. Michel RosaChief Marketing Officer & Senior VP of Strategy
- Mr. Tom Bauer CPLSenior Vice President of Global human resources
- Mr. Robert FiordaliceSenior VP & GM of Metrology Business Unit
- Mr. Ido DolevExecutive Vice President of Product Solutions Group
- Ms. Shirley ChenSenior vice president of customer success