Adisyn secures second US patent for graphene tech
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- Adisyn secured a second US patent allowance from the United States Patent and Trademark Office for its graphene-coated semiconductor products.
- The announcement had a neutral market reaction as trading shares held steady following the update.
- The company stated that the intellectual property expansion aims to strengthen commercialisation and partner engagement.
Adisyn (ASX:AI1) secured a second United States patent allowance covering graphene-coated surfaces designed for semiconductor applications.
The latest allowance follows an earlier patent granted on May 7, expanding intellectual property protection across the business.
"The patent allowance announced on May 7 protects a graphene coating method and its outputs," explained Adisyn Managing Director Arye Kohavi.
The allowed claims cover end-products featuring a median copper grain size of less than 0.9 microns and reduced shorts and voids at temperatures of 400°C or higher.
The company stated that this intellectual property portfolio supports ongoing commercial discussions for next-generation semiconductor and radar reduction applications.
Following the announcement, the Adisyn share price was unchanged at $0.13.
Adisyn operates through technology subsidiaries, including 2D Generation, focusing on advanced materials and industrial applications.
Prior corporate updates include the demonstration of continuous graphene film formation on copper substrates using industrial atomic layer deposition systems.
